Andrew R. Neureuther

	2010
13		Lynn T.-N. Wang, Nuo Xu, Seng Oon Toh, Andrew R. Neureuther, Tsu-Jae King Liu, Borivoje Nikolic: Parameter-specific ring oscillator for process monitoring at the 45 nm node. CICC 2010: 1-4
	2008
12		Jae-Seok Yang, Andrew R. Neureuther: Crosstalk Noise Variation Assessment and Analysis for the Worst Process Corner. ISQED 2008: 352-356
	2004
11		Frank Gennari, Andrew R. Neureuther: A Pattern Matching System for Linking TCAD and EDA. ISQED 2004: 165-170
	1995
10		Alfred Kwok Kit Wong, Roberto Guerrieri, Andrew R. Neureuther: Massively parallel electromagnetic simulation for photolithographic applications. IEEE Trans. on CAD of Integrated Circuits and Systems 14(10): 1231-1240 (1995)
	1994
9		Edward W. Scheckler, Andrew R. Neureuther: Models and algorithms for three-dimensional topography simulation with SAMPLE-3D. IEEE Trans. on CAD of Integrated Circuits and Systems 13(2): 219-230 (1994)
8		Kenny K. H. Toh, Andrew R. Neureuther, Edward W. Scheckler: Algorithms for simulation of three-dimensional etching. IEEE Trans. on CAD of Integrated Circuits and Systems 13(5): 616-624 (1994)
	1993
7		Edward W. Scheckler, Nelson N. Tam, Anton K. Pfau, Andrew R. Neureuther: An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification. IEEE Trans. on CAD of Integrated Circuits and Systems 12(9): 1345-1356 (1993)
	1992
6		Edward W. Scheckler, Alexander S. Wong, Robert K. Wang, Goodwin R. Chin, John R. Camagna, Andrew R. Neureuther, Robert W. Dutton: A utility-based integrated system for process simulation. IEEE Trans. on CAD of Integrated Circuits and Systems 11(7): 911-920 (1992)
	1991
5		Goodwin R. Chin, Walter C. Dietrich Jr., Duane S. Boning, Alexander S. Wong, Andrew R. Neureuther, Robert W. Dutton: Linking TCAD to EDA - Benefits and Issues. DAC 1991: 573-578
4		Roberto Guerrieri, Karim H. Tadros, John K. Gamelin, Andrew R. Neureuther: Massively parallel algorithms for scattering in optical lithography. IEEE Trans. on CAD of Integrated Circuits and Systems 10(9): 1091-1100 (1991)
3		Alexander S. Wong, Andrew R. Neureuther: The intertool profile interchange format: a technology CAD environment approach [semiconductor technology]. IEEE Trans. on CAD of Integrated Circuits and Systems 10(9): 1157-1162 (1991)
	1988
2		K. Lee, Andrew R. Neureuther: SIMPL-2: (SIMulated Profiles from the Layout-Version 2). IEEE Trans. on CAD of Integrated Circuits and Systems 7(2): 160-167 (1988)
1		Roberto Guerrieri, Andrew R. Neureuther: Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithography. IEEE Trans. on CAD of Integrated Circuits and Systems 7(7): 755-764 (1988)

Coauthor Index

1	Duane S. Boning	[5]
2	John R. Camagna	[6]
3	Goodwin R. Chin	[5] [6]
4	Walter C. Dietrich Jr.	[5]
5	Robert W. Dutton	[5] [6]
6	John K. Gamelin	[4]
7	Frank Gennari	[11]
8	Roberto Guerrieri	[1] [4] [10]
9	K. Lee	[2]
10	Tsu-Jae King Liu	[13]
11	Borivoje Nikolic	[13]
12	Anton K. Pfau	[7]
13	Edward W. Scheckler	[6] [7] [8] [9]
14	Karim H. Tadros	[4]
15	Nelson N. Tam	[7]
16	Kenny K. H. Toh	[8]
17	Seng Oon Toh	[13]
18	Lynn T.-N. Wang	[13]
19	Robert K. Wang	[6]
20	Alexander S. Wong	[3] [5] [6]
21	Alfred Kwok Kit Wong	[10]
22	Nuo Xu	[13]
23	Jae-Seok Yang	[12]

Colors in the list of coauthors

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