Yuto Momma

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2007

1 Tetsuo Endoh, Yuto Momma: Study of 30-nm Double-Gate MOSFET with Halo Implantation Technology Using a Two-Dimensional Device Simulator. IEICE Transactions 90-C(5): 1000-1005 (2007)

	2007
1		Tetsuo Endoh, Yuto Momma: Study of 30-nm Double-Gate MOSFET with Halo Implantation Technology Using a Two-Dimensional Device Simulator. IEICE Transactions 90-C(5): 1000-1005 (2007)

Coauthor Index

1 Tetsuo Endoh [1]

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