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| 2001 | ||
|---|---|---|
| 1 | Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham: TCAD development for lithography resolution enhancement. IBM Journal of Research and Development 45(5): 651-666 (2001) | |
| 1 | Timothy G. Dunham | [1] |
| 2 | Mark A. Lavin | [1] |
| 3 | William C. Leipold | [1] |
| 4 | Lars Liebmann | [1] |
| 5 | Alfred K. Wong | [1] |
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