 | 2011 |
| 5 |  | Chenyue Ma,
Lining Zhang,
Chenfei Zhang,
Xiufang Zhang,
Jin He,
Xing Zhang:
A physical based model to predict performance degradation of FinFET accounting for interface state distribution effect due to hot carrier injection.
Microelectronics Reliability 51(2): 337-341 (2011) |
| 2010 |
| 4 |  | Chenyue Ma,
Hao Wang,
Xiufang Zhang,
Frank He,
Yadong He,
Xing Zhang,
Xinnan Lin:
Asymmetric issues of FinFET device after hot carrier injection and impact on digital and analog circuits.
ISQED 2010: 432-436 |
| 3 |  | Chenyue Ma,
Hao Wang,
Chenfei Zhang,
Xiufang Zhang,
Jin He,
Xing Zhang:
Temperature dependence of the interface state distribution due to hot carrier effect in FinFET device.
Microelectronics Reliability 50(8): 1077-1080 (2010) |
| 2009 |
| 2 |  | Chenyue Ma,
Bo Li,
Lining Zhang,
Jin He,
Xing Zhang,
Xinnan Lin,
Mansun Chan:
A unified FinFET reliability model including high K gate stack dynamic threshold voltage, hot carrier injection, and negative bias temperature instability.
ISQED 2009: 7-12 |
| 2008 |
| 1 |  | Yue Fu,
Jin He,
Feng Liu,
Jie Feng,
Chenyue Ma,
Lining Zhang:
Study on the Si-Ge Nanowire MOSFETs with the Core-Shell Structure.
ISQED 2008: 531-536 |