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Lars Liebmann Coauthor index pubzone.org

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DBLP keys2011
10Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLRani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta: A framework for double patterning-enabled design. ICCAD 2011: 14-20
9Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLShayak Banerjee, Kanak B. Agarwal, Sani R. Nassif, James A. Culp, Lars Liebmann, Michael Orshansky: Coupling timing objectives with optical proximity correction for improved timing yield. ISQED 2011: 97-102
2010
8Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLTejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry T. Pileggi, Andrzej J. Strojwas, Jason Hibbeler: Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings. IEEE Trans. on CAD of Integrated Circuits and Systems 29(4): 509-527 (2010)
2008
7Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLShayak Banerjee, Praveen Elakkumanan, Lars Liebmann, Michael Orshansky: Electrically driven optical proximity correction based on linear programming. ICCAD 2008: 473-479
2007
6Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLLouis Scheffer, Lars Liebmann, Riko Rakojcic, David White: Rules vs tools: what's the right way to address IC manufacturing complexity? ISPD 2007: 75-76
2003
5Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLLars Liebmann: Layout impact of resolution enhancement techniques: impediment or opportunity? ISPD 2003: 110-117
2002
4Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLMark A. Lavin, Lars Liebmann: CAD computation for manufacturability: can we save VLSI technology from itself? ICCAD 2002: 424-431
2001
3Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLLars Liebmann, Jennifer Lund, Fook-Luen Heng, Ioana Graur: Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking. DAC 2001: 79-84
2Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLFook-Luen Heng, Lars Liebmann, Jennifer Lund: Application of automated design migration to alternating phase shift mask design. ISPD 2001: 38-43
1Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLLars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham: TCAD development for lithography resolution enhancement. IBM Journal of Research and Development 45(5): 651-666 (2001)

Coauthor Index

1Kanak B. Agarwal [9] [10]
2Shayak Banerjee [7] [9]
3James A. Culp [9]
4Timothy G. Dunham [1]
5Praveen Elakkumanan [7]
6Rani S. Ghaida [10]
7Ioana Graur [3]
8Puneet Gupta [10]
9Fook-Luen Heng [2] [3]
10Jason Hibbeler [8]
11Tejas Jhaveri [8]
12Mark A. Lavin [1] [4]
13William C. Leipold [1]
14Jennifer Lund [2] [3]
15Scott M. Mansfield [1]
16Sani R. Nassif [9] [10]
17Michael Orshansky [7] [9]
18Lawrence T. Pileggi (Larry T. Pileggi, Lawrence T. Pillage) [8]
19Riko Rakojcic [6]
20Vyacheslav Rovner [8]
21Louis Scheffer [6]
22Andrzej J. Strojwas (Andreas J. Strojwas) [8]
23David White [6]
24Alfred K. Wong [1]
25Xin Yuan [10]

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