 | 2011 |
| 10 |  | Rani S. Ghaida,
Kanak B. Agarwal,
Sani R. Nassif,
Xin Yuan,
Lars Liebmann,
Puneet Gupta:
A framework for double patterning-enabled design.
ICCAD 2011: 14-20 |
| 9 |  | Shayak Banerjee,
Kanak B. Agarwal,
Sani R. Nassif,
James A. Culp,
Lars Liebmann,
Michael Orshansky:
Coupling timing objectives with optical proximity correction for improved timing yield.
ISQED 2011: 97-102 |
| 2010 |
| 8 |  | Tejas Jhaveri,
Vyacheslav Rovner,
Lars Liebmann,
Larry T. Pileggi,
Andrzej J. Strojwas,
Jason Hibbeler:
Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings.
IEEE Trans. on CAD of Integrated Circuits and Systems 29(4): 509-527 (2010) |
| 2008 |
| 7 |  | Shayak Banerjee,
Praveen Elakkumanan,
Lars Liebmann,
Michael Orshansky:
Electrically driven optical proximity correction based on linear programming.
ICCAD 2008: 473-479 |
| 2007 |
| 6 |  | Louis Scheffer,
Lars Liebmann,
Riko Rakojcic,
David White:
Rules vs tools: what's the right way to address IC manufacturing complexity?
ISPD 2007: 75-76 |
| 2003 |
| 5 |  | Lars Liebmann:
Layout impact of resolution enhancement techniques: impediment or opportunity?
ISPD 2003: 110-117 |
| 2002 |
| 4 |  | Mark A. Lavin,
Lars Liebmann:
CAD computation for manufacturability: can we save VLSI technology from itself?
ICCAD 2002: 424-431 |
| 2001 |
| 3 |  | Lars Liebmann,
Jennifer Lund,
Fook-Luen Heng,
Ioana Graur:
Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking.
DAC 2001: 79-84 |
| 2 |  | Fook-Luen Heng,
Lars Liebmann,
Jennifer Lund:
Application of automated design migration to alternating phase shift mask design.
ISPD 2001: 38-43 |
| 1 |  | Lars Liebmann,
Scott M. Mansfield,
Alfred K. Wong,
Mark A. Lavin,
William C. Leipold,
Timothy G. Dunham:
TCAD development for lithography resolution enhancement.
IBM Journal of Research and Development 45(5): 651-666 (2001) |