![]() | ![]() |
| 2010 | ||
|---|---|---|
| 2 | Tejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry T. Pileggi, Andrzej J. Strojwas, Jason Hibbeler: Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings. IEEE Trans. on CAD of Integrated Circuits and Systems 29(4): 509-527 (2010) | |
| 2009 | ||
| 1 | Andrzej J. Strojwas, Tejas Jhaveri, Vyacheslav Rovner, Lawrence T. Pileggi: Creating an affordable 22nm node using design-lithography co-optimization. DAC 2009: 95-96 | |
| 1 | Jason Hibbeler | [2] |
| 2 | Lars Liebmann | [2] |
| 3 | Lawrence T. Pileggi (Larry T. Pileggi, Lawrence T. Pillage) | [1] [2] |
| 4 | Vyacheslav Rovner | [1] [2] |
| 5 | Andrzej J. Strojwas (Andreas J. Strojwas) | [1] [2] |
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