![]() | ![]() |
| 2001 | ||
|---|---|---|
| 1 | G. Innertsberger, T. Pompl, M. Kerber: The influence of p-polysilicon gate doping on the dielectric breakdown of PMOS devices. Microelectronics Reliability 41(7): 973-975 (2001) | |
| 1 | M. Kerber | [1] |
| 2 | T. Pompl | [1] |
Data released under the ODC-BY 1.0 license — See also our legal information page