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 | 2011 | |
|---|---|---|
| 3 |      | Robert O'Connor, Greg Hughes: The effect of a post processing thermal anneal on pre-existing and stress induced electrically active defects in ultra-thin SiON dielectric layers. Microelectronics Reliability 51(3): 524-528 (2011) |
| 2 | | Robert O'Connor, Greg Hughes, Thomas Kauerauf, Lars-Ake Ragnarsson: Reliability of thin ZrO2 gate dielectric layers. Microelectronics Reliability 51(6): 1118-1122 (2011) |
| 2005 | ||
| 1 | | Robert O'Connor, Greg Hughes, Robin Degraeve, Ben Kaczer: Progressive breakdown in ultrathin SiON dielectrics and its effect on transistor performance. Microelectronics Reliability 45(5-6): 869-874 (2005) |
| 1 | Robin Degraeve | [1] |
| 2 | Ben Kaczer | [1] |
| 3 | Thomas Kauerauf | [2] |
| 4 | Robert O'Connor | [1] [2] [3] |
| 5 | Lars-Ake Ragnarsson | [2] |
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