Frances A. Houle

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2001

1 William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff: Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists. IBM Journal of Research and Development 45(5): 667-682 (2001)

	2001
1		William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff: Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists. IBM Journal of Research and Development 45(5): 667-682 (2001)

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