Jason Hibbeler

	2010
4		Tejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry T. Pileggi, Andrzej J. Strojwas, Jason Hibbeler: Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings. IEEE Trans. on CAD of Integrated Circuits and Systems 29(4): 509-527 (2010)
	2006
3		Markus Bühler, Jürgen Koehl, Jeanne Bickford, Jason Hibbeler, Ulf Schlichtmann, R. Sommer, Michael Pronath, Andreas Ripp: DFM/DFY design for manufacturability and yield - influence of process variations in digital, analog and mixed-signal circuit design. DATE 2006: 387-392
2		Jeanne Bickford, Jason Hibbeler, Markus Bühler, Jürgen Koehl, Dirk Müller, Sven Peyer, Christian Schulte: Yield Improvement by Local Wiring Redundancy. ISQED 2006: 473-478
	2005
1		Xin Yuan, Kevin W. McCullen, Fook-Luen Heng, Robert F. Walker, Jason Hibbeler, Robert J. Allen, Rani R. Narayan: Technology migration technique for designs with strong RET-driven layout restrictions. ISPD 2005: 175-182

Coauthor Index

1	Robert J. Allen	[1]
2	Jeanne Bickford	[2] [3]
3	Markus Bühler	[2] [3]
4	Fook-Luen Heng	[1]
5	Tejas Jhaveri	[4]
6	Jürgen Koehl	[2] [3]
7	Lars Liebmann	[4]
8	Kevin W. McCullen	[1]
9	Dirk Müller	[2]
10	Rani R. Narayan	[1]
11	Sven Peyer	[2]
12	Lawrence T. Pileggi (Larry T. Pileggi, Lawrence T. Pillage)	[4]
13	Michael Pronath	[3]
14	Andreas Ripp	[3]
15	Vyacheslav Rovner	[4]
16	Ulf Schlichtmann	[3]
17	Christian Schulte	[2]
18	R. Sommer	[3]
19	Andrzej J. Strojwas (Andreas J. Strojwas)	[4]
20	Robert F. Walker	[1]
21	Xin Yuan	[1]

Colors in the list of coauthors

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