Masahiko Hasunuma

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2005

1 Takashi Kawanoue, Seiichi Omoto, Masahiko Hasunuma, Takashi Yoda: Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias temperature stress conditions. IEICE Electronic Express 2(7): 254-259 (2005)

	2005
1		Takashi Kawanoue, Seiichi Omoto, Masahiko Hasunuma, Takashi Yoda: Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias temperature stress conditions. IEICE Electronic Express 2(7): 254-259 (2005)

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