David L. Harmon

	2003
2		Ernest Y. Wu, Jordi Suñé, Wing L. Lai, Alex Vayshenker, Edward J. Nowak, David L. Harmon: Critical reliability challenges in scaling SiO2-based dielectric to its limit. Microelectronics Reliability 43(8): 1175-1184 (2003)
	2002
1		Ernest Y. Wu, Edward J. Nowak, Alex Vayshenker, Wing L. Lai, David L. Harmon: CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics. IBM Journal of Research and Development 46(2-3): 287-298 (2002)

Coauthor Index

1	Wing L. Lai	[1] [2]
2	Edward J. Nowak	[1] [2]
3	Jordi Suñé	[2]
4	Alex Vayshenker	[1] [2]
5	Ernest Y. Wu	[1] [2]

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