Yoshinao Harada

	2001
2		Koji Eriguchi, Yoshinao Harada, Masaaki Niwa: Effects of base layer thickness on reliability of CVD Si3N4 stack gate dielectrics. Microelectronics Reliability 41(4): 587-595 (2001)
1		Takayuki Yamada, Masaru Moriwaki, Yoshinao Harada, Shinji Fujii, Koji Eriguchi: Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics. Microelectronics Reliability 41(5): 697-704 (2001)

Coauthor Index

1	Koji Eriguchi	[1] [2]
2	Shinji Fujii	[1]
3	Masaru Moriwaki	[1]
4	Masaaki Niwa	[2]
5	Takayuki Yamada	[1]

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