 | 2006 |
|---|
| 5 |       | W. Wessner,
Johann Cervenka,
Clemens Heitzinger,
Andreas Hössinger,
Siegfried Selberherr:
Anisotropic Mesh Refinement for the Simulation of Three-Dimensional Semiconductor Manufacturing Processes.
IEEE Trans. on CAD of Integrated Circuits and Systems 25(10): 2129-2139 (2006) |
| 2004 |
|---|
| 4 | | Clemens Heitzinger,
Andreas Hössinger,
Siegfried Selberherr:
An algorithm for smoothing three-dimensional Monte Carlo ion implantation simulation results.
Mathematics and Computers in Simulation 66(2-3): 219-230 (2004) |
| 2003 |
|---|
| 3 | | Clemens Heitzinger,
Andreas Hössinger,
Siegfried Selberherr:
On smoothing three-dimensional Monte Carlo ion implantation simulation results.
IEEE Trans. on CAD of Integrated Circuits and Systems 22(7): 879-883 (2003) |
| 2 | | Thomas Binder,
Andreas Hössinger,
Siegfried Selberherr:
Rigorous integration of semiconductor process and device simulators.
IEEE Trans. on CAD of Integrated Circuits and Systems 22(9): 1204-1214 (2003) |
| 2000 |
|---|
| 1 | | Andreas Hössinger,
Erasmus Langer,
Siegfried Selberherr:
Parallelization of a Monte Carlo ion implantation simulator.
IEEE Trans. on CAD of Integrated Circuits and Systems 19(5): 560-567 (2000) |
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