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| 2005 | ||
|---|---|---|
| 1 | M. C. Lemme, J. K. Efavi, H. D. B. Gottlob, T. Mollenhauer, T. Wahlbrink, H. Kurz: Comparison of metal gate electrodes on MOCVD HfO2. Microelectronics Reliability 45(5-6): 953-956 (2005) | |
| 1 | J. K. Efavi | [1] |
| 2 | H. Kurz | [1] |
| 3 | M. C. Lemme | [1] |
| 4 | T. Mollenhauer | [1] |
| 5 | T. Wahlbrink | [1] |
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