 | 2009 |
| 9 |  | R. Al Asmar,
S. Youssef,
Y. Zaatar,
J. Podlecki,
C. Eid,
A. Foucaran:
Hyper frequency modeling of resonated systems based on piezoelectric LiTaO3 thin layers.
Microelectronics Journal 40(3): 624-627 (2009) |
| 2008 |
| 8 |  | N. Crespy,
Johann Courteaud,
Philippe Combette,
Pierre Temple-Boyer,
Alain Giani,
A. Foucaran:
Micromachined Inclinometer Based on Fluid Convection
CoRR abs/0805.0904: (2008) |
| 7 |  | S. Youssef,
R. Al Asmar,
J. Podlecki,
M. Abdallah,
D. Zaouk,
A. Foucaran:
Preliminary study on pyroelectric lithium tantalite by a novel electrostatic spray pyrolysis technique.
Microelectronics Journal 39(5): 792-796 (2008) |
| 2007 |
| 6 |  | S. Youssef,
R. Al Asmar,
J. Podlecki,
Frédérique Pascal-Delannoy,
Y. Zaatar,
A. Foucaran:
Characterization of LiTaO3 thin films fabricated by sol-gel technique.
Microelectronics Journal 38(1): 63-66 (2007) |
| 5 |  | Y. Zaatar,
R. Al Asmar,
J. Podlecki,
S. Youssef,
M. Abdallah,
N. Ouaini,
A. Foucaran:
Fabrication and characterization of stacked ZnO and ZnOGa2O3 layers for the realization of bulk acoustic wave resonated membranes.
Microelectronics Journal 38(4-5): 538-546 (2007) |
| 4 |  | D. Zaouk,
R. Al Asmar,
J. Podlecki,
Y. Zaatar,
A. Khoury,
A. Foucaran:
X-ray diffraction studies of electrostatic sprayed SnO2: F films.
Microelectronics Journal 38(8-9): 884-887 (2007) |
| 2006 |
| 3 |  | R. Al Asmar,
J.-P. Atanas,
Y. Zaatar,
J. Podlecki,
A. Foucaran:
Characterization and ellipsometric investigation of high-quality ZnO and ZnO(Ga2O3) thin alloys by reactive electron-beam co-evaporation technique.
Microelectronics Journal 37(10): 1080-1085 (2006) |
| 2005 |
| 2 |  | R. Al Asmar,
G. Ferblantier,
J. L. Sauvajol,
Alain Giani,
A. Khoury,
A. Foucaran:
Fabrication and characterisation of high quality ZnO thin films by reactive electron beam evaporation technique.
Microelectronics Journal 36(8): 694-699 (2005) |
| 2003 |
| 1 |  | R. Ondo-Ndong,
G. Ferblantier,
Frédérique Pascal-Delannoy,
A. Boyer,
A. Foucaran:
Electrical properties of zinc oxide sputtered thin films.
Microelectronics Journal 34(11): 1087-1092 (2003) |