Y. G. Fedorenko

	2005
2		Y. G. Fedorenko, L. Truong, V. V. Afanasev, A. Stesmans, Z. Zhang, Stephen A. Campbell: Impact of nitrogen incorporation on interface states in (100)Si/HfO2. Microelectronics Reliability 45(5-6): 802-805 (2005)
1		L. Truong, Y. G. Fedorenko, V. V. Afanasev, A. Stesmans: Admittance spectroscopy of traps at the interfaces of (100)Si with Al2O3, ZrO2, and HfO2. Microelectronics Reliability 45(5-6): 823-826 (2005)

Coauthor Index

1	V. V. Afanasev	[1] [2]
2	Stephen A. Campbell	[2]
3	A. Stesmans	[1] [2]
4	L. Truong	[1] [2]
5	Z. Zhang	[2]

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