Masayuki Endo

	1991
2		Yoshihiko Hirai, Sadafumi Tomida, Kazushi Ikeda, Masaru Sasago, Masayuki Endo, Sigeru Hayama, Noboru Nomura: Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system). IEEE Trans. on CAD of Integrated Circuits and Systems 10(6): 802-807 (1991)
	1987
1		Yoshihiko Hirai, Masaru Sasago, Masayuki Endo, K. Tsuji, Yojiro Mano: Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process. IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 403-409 (1987)

Coauthor Index

1	Sigeru Hayama	[2]
2	Yoshihiko Hirai	[1] [2]
3	Kazushi Ikeda	[2]
4	Yojiro Mano	[1]
5	Noboru Nomura	[2]
6	Masaru Sasago	[1] [2]
7	Sadafumi Tomida	[2]
8	K. Tsuji	[1]

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