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| 2009 | ||
|---|---|---|
| 3 | P. Thangadurai, W. D. Kaplan, V. Mikhelashvili, G. Eisenstein: The influence of electron-beam irradiation on electrical characteristics of metal-insulator-semiconductor capacitors based on a high-k dielectric stack of HfTiSiO(N) and HfTiO(N) layers. Microelectronics Reliability 49(7): 716-720 (2009) | |
| 2005 | ||
| 2 | V. Mikhelashvili, B. Meyler, J. Shneider, O. Kreinin, G. Eisenstein: Electrical properties of MIS capacitor using low temperature electron beam gun - evaporated HfAlO dielectrics. Microelectronics Reliability 45(5-6): 933-936 (2005) | |
| 2001 | ||
| 1 | V. Mikhelashvili, G. Eisenstein: Optical and electrical characterization of the electron beam gun evaporated TiO2 film. Microelectronics Reliability 41(7): 1057-1061 (2001) | |
| 1 | W. D. Kaplan | [3] |
| 2 | O. Kreinin | [2] |
| 3 | B. Meyler | [2] |
| 4 | V. Mikhelashvili | [1] [2] [3] |
| 5 | J. Shneider | [2] |
| 6 | P. Thangadurai | [3] |
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