Donna R. Cote

	1999
2		Donna R. Cote, Son Van Nguyen, Anthony K. Stamper, Douglas S. Armbrust, Dirk Tobben, Richard A. Conti, Gill Yong Lee: Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits. IBM Journal of Research and Development 43(1): 5-38 (1999)
	1995
1		Donna R. Cote, Son Van Nguyen, William J. Cote, Scott L. Pennington, Anthony K. Stamper, Dragan V. Podlesnik: Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM. IBM Journal of Research and Development 39(4): 437-464 (1995)

Coauthor Index

1	Douglas S. Armbrust	[2]
2	Richard A. Conti	[2]
3	William J. Cote	[1]
4	Gill Yong Lee	[2]
5	Son Van Nguyen	[1] [2]
6	Scott L. Pennington	[1]
7	Dragan V. Podlesnik	[1]
8	Anthony K. Stamper	[1] [2]
9	Dirk Tobben	[2]

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