B. Colombeau

	2001
1		Laurent Jalabert, Pierre Temple-Boyer, Gérard Sarrabayrouse, F. Cristiano, B. Colombeau, F. Voillot, C. Armand: Reduction of boron penetration through thin silicon oxide with a nitrogen doped silicon layer. Microelectronics Reliability 41(7): 981-985 (2001)

Coauthor Index

1	C. Armand	[1]
2	F. Cristiano	[1]
3	Laurent Jalabert	[1]
4	Gérard Sarrabayrouse	[1]
5	Pierre Temple-Boyer	[1]
6	F. Voillot	[1]

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