Lucila Cescato

	2006
1		Edson J. Carvalho, Marco A. R. Alves, Edmundo S. Braga, Lucila Cescato: SiO2 single layer for reduction of the standing wave effects in the interference lithography of deep photoresist structures on Si. Microelectronics Journal 37(11): 1265-1270 (2006)

Coauthor Index

1	Marco A. R. Alves	[1]
2	Edmundo S. Braga	[1]
3	Edson J. Carvalho	[1]

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