Robert A. Buhrman

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1999

1 Kenneth A. Ellis, Robert A. Buhrman: Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics. IBM Journal of Research and Development 43(3): 287-300 (1999)

	1999
1		Kenneth A. Ellis, Robert A. Buhrman: Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics. IBM Journal of Research and Development 43(3): 287-300 (1999)

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