![]() | ![]() |
| 2007 | ||
|---|---|---|
| 2 | A. Rothschild, R. Mitsuhashi, C. Kerner, X. Shi, J. L. Everaert, L. Date, Thierry Conard, Olivier Richard, C. Vrancken, R. Verbeeck, A. Veloso, A. Lauwers, M. de Potter de ten Broeck, I. Debusschere, M. Jurczak, M. Niwa, P. Absil, S. Biesemans: Optimization of HfSiON using a design of experiment (DOE) approach on 0.45 V Vt Ni-FUSI CMOS transistors. Microelectronics Reliability 47(4-5): 521-524 (2007) | |
| 2005 | ||
| 1 | E. Sleeckx, Marc Schaekers, X. Shi, E. Kunnen, B. Degroote, M. Jurczak, M. de Potter de ten Broeck, E. Augendre: Optimization of low temperature silicon nitride processes for improvement of device performance. Microelectronics Reliability 45(5-6): 865-868 (2005) | |
| 1 | P. Absil | [2] |
| 2 | E. Augendre | [1] |
| 3 | S. Biesemans | [2] |
| 4 | Thierry Conard | [2] |
| 5 | L. Date | [2] |
| 6 | I. Debusschere | [2] |
| 7 | B. Degroote | [1] |
| 8 | J. L. Everaert | [2] |
| 9 | M. Jurczak | [1] [2] |
| 10 | C. Kerner | [2] |
| 11 | E. Kunnen | [1] |
| 12 | A. Lauwers | [2] |
| 13 | R. Mitsuhashi | [2] |
| 14 | M. Niwa | [2] |
| 15 | Olivier Richard | [2] |
| 16 | A. Rothschild | [2] |
| 17 | Marc Schaekers | [1] |
| 18 | X. Shi | [1] [2] |
| 19 | E. Sleeckx | [1] |
| 20 | A. Veloso | [2] |
| 21 | R. Verbeeck | [2] |
| 22 | C. Vrancken | [2] |
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