I. W. Boyd

	2005
1		Q. Fang, I. Liaw, M. Modreanu, P. K. Hurley, I. W. Boyd: Post deposition UV-induced O2 annealing of HfO2 thin films. Microelectronics Reliability 45(5-6): 957-960 (2005)

Coauthor Index

1	Q. Fang	[1]
2	P. K. Hurley	[1]
3	I. Liaw	[1]
4	M. Modreanu	[1]

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