A. Bonfiglietti

	2005
1		A. Pecora, L. Maiolo, A. Bonfiglietti, M. Cuscunà, F. Mecarini, L. Mariucci, G. Fortunato, N. D. Young: Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing. Microelectronics Reliability 45(5-6): 879-882 (2005)

Coauthor Index

1	M. Cuscunà	[1]
2	G. Fortunato	[1]
3	L. Maiolo	[1]
4	L. Mariucci	[1]
5	F. Mecarini	[1]
6	A. Pecora	[1]
7	N. D. Young	[1]

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