V. N. Bliznetsov

	2005
2		H. Y. Li, Y. J. Su, C. F. Tsang, S. M. Sohan, V. N. Bliznetsov, L. Zhang: Process improvement of 0.13mum Cu/Low K (Black DiamondTM) dual damascene interconnection. Microelectronics Reliability 45(7-8): 1134-1143 (2005)
	2003
1		C. F. Tsang, V. N. Bliznetsov, Y. J. Su: Study and improvement of electrical performance of 130 nm Cu/CVD low k SiOCH interconnect related to via etch process. Microelectronics Journal 34(11): 1051-1058 (2003)

Coauthor Index

1	H. Y. Li	[2]
2	S. M. Sohan	[2]
3	Y. J. Su	[1] [2]
4	C. F. Tsang	[1] [2]
5	L. Zhang	[2]

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