 | 2005 |
| 4 |  | X. Blasco,
M. Nafría,
X. Aymerich,
J. Pétry,
Wilfried Vandervorst:
Breakdown spots of ultra-thin (EOT<1.5nm) HfO2/SiO2 stacks observed with enhanced - CAFM.
Microelectronics Reliability 45(5-6): 811-814 (2005) |
| 2002 |
| 3 |  | X. Blasco,
M. Nafría,
X. Aymerich:
Conduction and Breakdown Behaviour of Atomic Force Microscopy Grown SiO2 Gate Oxide on MOS Structures.
Microelectronics Reliability 42(9-11): 1513-1516 (2002) |
| 2001 |
| 2 |  | M. Porti,
X. Blasco,
M. Nafría,
X. Aymerich,
Alexander Olbrich,
Bernd Ebersberger:
Local current fluctuations before and after breakdown of thin SiO2 films observed with conductive atomic force microscope.
Microelectronics Reliability 41(7): 1041-1044 (2001) |
| 1 |  | D. Hill,
X. Blasco,
M. Porti,
M. Nafría,
X. Aymerich:
Characterising the surface roughness of AFM grown SiO2 on Si.
Microelectronics Reliability 41(7): 1077-1079 (2001) |