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| 2005 | ||
|---|---|---|
| 1 | Zs. Tökei, Y.-L. Li, G. P. Beyer: Reliability challenges for copper low-k dielectrics and copper diffusion barriers. Microelectronics Reliability 45(9-11): 1436-1442 (2005) | |
| 1 | Y.-L. Li | [1] |
| 2 | Zs. Tökei | [1] |
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