G. Barbar

	2005
1		U. Weber, M. Schumacher, J. Lindner, O. Boissière, P. Lehnen, S. Miedl, P. K. Baumann, G. Barbar, C. Lohe, T. McEntee: AVD® technology for deposition of next generation devices. Microelectronics Reliability 45(5-6): 945-948 (2005)

Coauthor Index

1	P. K. Baumann	[1]
2	O. Boissière	[1]
3	P. Lehnen	[1]
4	J. Lindner	[1]
5	C. Lohe	[1]
6	T. McEntee	[1]
7	S. Miedl	[1]
8	M. Schumacher	[1]
9	U. Weber	[1]

Last update Sun May 27 04:04:01 2012 CET by the DBLP Team — Data released under the ODC-BY 1.0 license — See also our legal information page