 | 2012 |
|---|
| 7 |       | Shayak Banerjee,
Kanak B. Agarwal,
Sani R. Nassif:
Design-aware lithography.
ISPD 2012: 3-8 |
| 2011 |
|---|
| 6 | | Shayak Banerjee,
Kanak B. Agarwal,
Sani R. Nassif:
Electrically-driven retargeting for nanoscale layouts.
CICC 2011: 1-4 |
| 5 | | Shayak Banerjee,
Kanak B. Agarwal,
Sani R. Nassif,
James A. Culp,
Lars Liebmann,
Michael Orshansky:
Coupling timing objectives with optical proximity correction for improved timing yield.
ISQED 2011: 97-102 |
| 2010 |
|---|
| 4 | | Shayak Banerjee,
Kanak B. Agarwal,
Michael Orshansky:
Ground rule slack aware tolerance-driven optical proximity correction for local metal interconnects.
CICC 2010: 1-4 |
| 3 | | Shayak Banerjee,
Kanak B. Agarwal,
Chin-Ngai Sze,
Sani R. Nassif,
Michael Orshansky:
A methodology for propagating design tolerances to shape tolerances for use in manufacturing.
DATE 2010: 1273-1278 |
| 2 | | Shayak Banerjee,
Kanak B. Agarwal,
Michael Orshansky:
SMATO: Simultaneous mask and target optimization for improving lithographic process window.
ICCAD 2010: 100-106 |
| 2008 |
|---|
| 1 | | Shayak Banerjee,
Praveen Elakkumanan,
Lars Liebmann,
Michael Orshansky:
Electrically driven optical proximity correction based on linear programming.
ICCAD 2008: 473-479 |
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