Yongchan Ban

	2011
8		Yongchan Ban, Jae-Seok Yang: Layout aware line-edge roughness modeling and poly optimization for leakage minimization. DAC 2011: 447-452
7		Yongchan Ban, Kevin Lucas, David Z. Pan: Flexible 2D layout decomposition framework for spacer-type double pattering lithography. DAC 2011: 789-794
6		Yen-Hung Lin, Yongchan Ban, David Z. Pan, Yih-Lang Li: Doppler: DPL-aware and OPC-friendly gridless detailed routing with mask density balancing. ICCAD 2011: 283-289
	2010
5		Yongchan Ban, David Z. Pan: Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography. DAC 2010: 408-411
4		Yongchan Ban, Savithri Sundareswaran, David Z. Pan: Total sensitivity based dfm optimization of standard library cells. ISPD 2010: 113-120
	2009
3		Minsik Cho, Kun Yuan, Yongchan Ban, David Z. Pan: ELIAD: Efficient Lithography Aware Detailed Routing Algorithm With Compact and Macro Post-OPC Printability Prediction. IEEE Trans. on CAD of Integrated Circuits and Systems 28(7): 1006-1016 (2009)
	2008
2		Minsik Cho, Kun Yuan, Yongchan Ban, David Z. Pan: ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction. DAC 2008: 504-509
1		Minsik Cho, Yongchan Ban, David Z. Pan: Double patterning technology friendly detailed routing. ICCAD 2008: 506-511

Coauthor Index

1	Minsik Cho	[1] [2] [3]
2	Yih-Lang Li	[6]
3	Yen-Hung Lin	[6]
4	Kevin Lucas	[7]
5	David Z. Pan (David Zhigang Pan)	[1] [2] [3] [4] [5] [6] [7]
6	Savithri Sundareswaran	[4]
7	Jae-Seok Yang	[8]
8	Kun Yuan	[2] [3]

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