Ari Aviram

	2001
1		David R. Medeiros, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee Kwong, Christopher K. Magg, Arpan P. Mahorowala, Wayne M. Moreau, Karen E. Petrillo, Marie Angelopoulos: Recent progress in electron-beam resists for advaced mask-making. IBM Journal of Research and Development 45(5): 639-650 (2001)

Coauthor Index

1	Marie Angelopoulos	[1]
2	C. Richard Guarnieri	[1]
3	Wu-Song Huang	[1]
4	Ranee Kwong	[1]
5	Christopher K. Magg	[1]
6	Arpan P. Mahorowala	[1]
7	David R. Medeiros	[1]
8	Wayne M. Moreau	[1]
9	Karen E. Petrillo	[1]

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