 | 2012 |
| 11 |  | E. Atanassova,
Albena Paskaleva,
D. Spassov:
Doped Ta2O5 and mixed HfO2-Ta2O5 films for dynamic memories applications at the nanoscale.
Microelectronics Reliability 52(4): 642-650 (2012) |
| 2011 |
| 10 |  | D. Spassov,
E. Atanassova,
Albena Paskaleva:
Lightly Al-doped Ta2O5: Electrical properties and mechanisms of conductivity.
Microelectronics Reliability 51(12): 2102-2109 (2011) |
| 2010 |
| 9 |  | E. Atanassova,
N. Novkovski,
Albena Paskaleva,
D. Spassov:
Constant current stress-induced leakage current in mixed HfO2-Ta2O5 stacks.
Microelectronics Reliability 50(6): 794-800 (2010) |
| 2008 |
| 8 |  | E. Atanassova,
Albena Paskaleva,
N. Novkovski:
Effects of the metal gate on the stress-induced traps in Ta2O5/SiO2 stacks.
Microelectronics Reliability 48(4): 514-525 (2008) |
| 7 |  | E. Atanassova,
Ninoslav Stojadinovic,
Albena Paskaleva:
Degradation behavior of Ta2O5 stacks and its dependence on the gate electrode.
Microelectronics Reliability 48(8-9): 1193-1197 (2008) |
| 2007 |
| 6 |  | E. Atanassova,
D. Spassov,
Albena Paskaleva:
Metal gates and gate-deposition-induced defects in Ta2O5 stack capacitors.
Microelectronics Reliability 47(12): 2088-2093 (2007) |
| 5 |  | E. Atanassova,
Albena Paskaleva:
Challenges of Ta2O5 as high-k dielectric for nanoscale DRAMs.
Microelectronics Reliability 47(6): 913-923 (2007) |
| 2005 |
| 4 |  | E. Atanassova,
R. V. Konakova,
V. F. Mitin,
J. Koprinarova,
O. S. Lytvym,
O. B. Okhrimenko,
V. V. Schinkarenko,
D. Virovska:
Effect of microwave radiation on the properties of Ta2O5-Si microstructures.
Microelectronics Reliability 45(1): 123-135 (2005) |
| 2003 |
| 3 |  | M. Pecovska-Gjorgjevich,
N. Novkovski,
E. Atanassova:
Electrical properties of thin RF sputtered Ta2O5 films after constant current stress.
Microelectronics Reliability 43(2): 235-241 (2003) |
| 2002 |
| 2 |  | E. Atanassova,
Albena Paskaleva:
Breakdown fields and conduction mechanisms in thin Ta2O5 layers on Si for high density DRAMs.
Microelectronics Reliability 42(2): 157-173 (2002) |
| 1 |  | E. Atanassova,
Dejan Spasov:
Thermal Ta2O5--alternative to SiO2 for storage capacitor application.
Microelectronics Reliability 42(8): 1171-1177 (2002) |