Douglas S. Armbrust

	1999
1		Donna R. Cote, Son Van Nguyen, Anthony K. Stamper, Douglas S. Armbrust, Dirk Tobben, Richard A. Conti, Gill Yong Lee: Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits. IBM Journal of Research and Development 43(1): 5-38 (1999)

Coauthor Index

1	Richard A. Conti	[1]
2	Donna R. Cote	[1]
3	Gill Yong Lee	[1]
4	Son Van Nguyen	[1]
5	Anthony K. Stamper	[1]
6	Dirk Tobben	[1]

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