L. Aguilera

	2008
2		W. Polspoel, Wilfried Vandervorst, L. Aguilera, M. Porti, M. Nafría, X. Aymerich: Nanometer-scale leakage measurements in high vacuum on de-processed high-k capacitors. Microelectronics Reliability 48(8-9): 1521-1524 (2008)
	2005
1		L. Aguilera, M. Porti, M. Nafría, X. Aymerich: Pre- and post-BD electrical conduction of stressed HfO2/SiO2 MOS gate stacks observed at the nanoscale. Microelectronics Reliability 45(9-11): 1390-1393 (2005)

Coauthor Index

1	X. Aymerich	[1] [2]
2	M. Nafría	[1] [2]
3	W. Polspoel	[2]
4	M. Porti	[1] [2]
5	Wilfried Vandervorst	[2]

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