 | 2009 |
| 3 |  | Apurba Laha,
E. Bugiel,
Rytis Dargis,
Dominik Schwendt,
M. Badylevich,
V. V. Afanasev,
A. Stesmans,
Andreas Fissel,
H. Jörg Osten:
Integration of low dimensional crystalline Si into functional epitaxial oxides.
Microelectronics Journal 40(3): 633-637 (2009) |
| 2005 |
| 2 |  | Y. G. Fedorenko,
L. Truong,
V. V. Afanasev,
A. Stesmans,
Z. Zhang,
Stephen A. Campbell:
Impact of nitrogen incorporation on interface states in (100)Si/HfO2.
Microelectronics Reliability 45(5-6): 802-805 (2005) |
| 1 |  | L. Truong,
Y. G. Fedorenko,
V. V. Afanasev,
A. Stesmans:
Admittance spectroscopy of traps at the interfaces of (100)Si with Al2O3, ZrO2, and HfO2.
Microelectronics Reliability 45(5-6): 823-826 (2005) |