J. Aarik

	2005
1		S. Dueñas, H. Castán, H. García, J. Barbolla, K. Kukli, J. Aarik, Mikko Ritala, Markku Leskelä: Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition. Microelectronics Reliability 45(5-6): 949-952 (2005)

Coauthor Index

1	J. Barbolla	[1]
2	H. Castán	[1]
3	S. Dueñas	[1]
4	H. García	[1]
5	K. Kukli	[1]
6	Markku Leskelä	[1]
7	Mikko Ritala	[1]

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